Semiconductor equipment and laser field
The compact design ensures that a large hollow (φ75) is realized within a very small height (65mm).
The stage provides ultra-smooth motion, angular second level accuracy and repeatability.
*Interface dimensions from LART150
|
Item |
Unit |
LART150 |
|
Tabletop diameter |
mm |
150 |
|
Height |
mm |
65 |
|
Hollow aperture |
mm |
75 |
|
Max. velocity |
rpm |
800 |
|
Peak torque |
N·m |
8 |
|
Continuous torque |
N·m |
2.6 |
|
Accuracy |
arcsec |
±1.5 |
|
Bidirectional repeatability |
arcsec |
±1 |
|
Max. load_Axial |
kg |
80 |
|
Max. load_Radial |
kg |
30 |
|
Axial error motion (Synchronous) |
nm |
<100 |
|
Radial error motion(Synchronous) |
nm |
<200 |
|
Tilt error motion (Synchronous) |
|
<2.5µrad (0.5arcsec) |
|
Operating pressure |
Mpa |
0.5 |
|
Air consumption |
L/min |
<25 |
|
Total mass |
Kg |
5 |
|
Adapted driver |
|
DC48V Driver |
＊Rotation velocity 60rpm based on the standard GBT+17421.7-2016(ISO230-7-2006)and GB/T17421.22000 as well as the temperature 22°(±0.5℃).
