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Electrostatic Chuck&Controller
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Electrostatic Chuck
Electrostatic Chuck
Electrostatic Chuck
Features

  • Coulomb's Law or Gradient Force electrostatic chuck  
  • Support Bi-polar, multi-polar electrode, interdigitated electrode design etc.
  • Suitable for UHV environments up to 10-5 Pa 
  • High clamping force
  • Typical global flatness: 5μm PV (D = 300 mm)
  • Flexible surface pattern design
  • Suitable for non-magnetic environment
  • Substrates include wafer, dielectric material such as sapphire, glass and more.

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Applications
  • Wafer Metrology: EBI, CD - SEM, Review - SEM
  • Wafer Manufacturing
  • Thin Film Deposition (CVD, PVD etc.)
  • Ion Implanter etc.
Description

The Electrostatic Chuck (ESC) is a holding tool for substrates such as silicon wafers in semiconductor processes. Based on the principle of electrostatic adsorption, the ESC fixes substrates like silicon wafers through Coulomb force or gradient force generated by the chuck after the application of an external high voltage.

 

Interface Definition

General dimension,Unit:mm

Technical Specifications
<<<Swipe left to see more parameters

Item

Unit

6inch ESC

8inch ESC

12inch ESC

Electrostatic type

 

Coulombic or Gradient

Coulombic or Gradient

Coulombic or Gradient

Electrode type

 

Bi-polar or interdigitated electrode

Accuracy

 

 

 

 

Global flatness

μm

<2

<2

<5

Parallelism

μm

<5

<5

<5

Electrical properties

 

 

 

 

Standard clamping voltage

V

1000

1000

1000

Leakage current

nA

<5

<5

<5

Performance parameter

 

 

 

 

Clamping force

N

≥8 (Coulomb)

≥12(Coulomb)

≥30(Coulomb)

Dimensions

 

 

 

 

Diameter

mm

144

194

294

Thickness

mm

12.6

12.6

12.6

*Customized requirements accepted

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