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Vacuum Chuck
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Vacuum Chuck
Vacuum Chuck
Vacuum Chuck
Features

  • High thermal conductivity, low coefficient of expansion 
  • Ultra-flat capabilities
  • High stiffness, better wear resistance
  • Lightweight design
  • High purity, no metal ion pollution
  • Customized requirements accepted

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Applications

Semiconductor lithography equipment

Semiconductor inspection equipment, such as film thickness measurement, OCD measurement, morphology measurement, defect inspection, etc.

Description

This chuck adopts lightweight design, and is made of materials with low coefficients of thermal expansion: pressureless sintered silicon carbide, silicon carbide, silicon nitride and aluminum nitride. 

This chuck features high stiffness, high thermal conductivity, low thermal expansion, high stability, high purity, uniform grain size, etc., which effectively reduces contamination from Particle and chemical cleaning and extends service lifetime.
 

Technical Specifications
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Item

 

Data

Flatness

μm

0.5

Applicable specifications

 

6/8' 12' 8/12'

Surface feature

 

pin type,ring type

Pin height

mm

0.05-0.2

Pin min. diameter

mm

φ0.2

Min. spacing

mm

3

Min. seal width

mm

0.7

Surface roughness

μm

Ra 0.02

Thickness tolerance

mm

±0.01

Diameter tolerance

mm

±0.01

Parallelism tolerance

μm

≤3

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